Delivery of 28nm lithography machines in China at the end of the year is expected to break through the blockade of the United States, Japan and the Netherlands- Hong Kong unwire.hk

2023-08-04 11:26:15

Following the United States and the Netherlands, Japan also formally restricted the export of semiconductor manufacturing equipment on July 23, putting pressure on China’s integrated manufacturing field and even the semiconductor industry. Recently, it was reported that China Shanghai Microelectronics is expected to deliver the first Chinese-made 28nm immersion lithography machine by the end of this year (2023).

The lithography machine is the most important equipment in the semiconductor industry, and it is also the key equipment for wafer manufacturing. The pros and cons of the lithography machine determine the process level and performance of the wafer. At present, the world’s mainstream lithography machine market is mainly monopolized by ASML in the Netherlands, Canon and Nikon in Japan, and the market share of high-end extreme ultraviolet lithography machines (EUV) is dominated by ASML in the Netherlands. According to Zhongshi News, the EUV lithography machine is extremely difficult to manufacture, because there are more than 450,000 parts in an EUV lithography machine, which is more than 20 times more than an F1 racing car. And even the EUV lithography giant ASML can only produce 15% of them, and the other 85% needs to integrate the global supply chain. Therefore, Zhongshi News pointed out that it is a difficult task for China to promote lithography machines.

It is reported that China Shanghai Microelectronics has been able to independently produce mid-to-high-end lithography machines with non-advanced processes. According to sources quoted by Taiwan media, Shanghai Microelectronics of China is developing a 28 nm immersion DUV lithography machine, and is expected to deliver the first Chinese-made SSA/800-10W lithography machine equipment to the market by the end of 2023. At the end of 2022, Huawei also announced a new patent titled “Mirror, lithography device and its control method” (CN115343915A). It is reported that progress can be made in the core technology of EUV lithography machines in the future.

China currently has the technology to mass-produce lithography machines above 90nm, but there is still a gap with the international advanced level.

Sources of pictures and data:China Times

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